LINE DOSE DEPENDENCE OF SILICON AND GALLIUM ARSENIDE REMOVAL BY A FOCUSED GALLIUM ION BEAM

Publisher: Edp Sciences

E-ISSN: 0449-1947|48|C6|C6-165-C6-170

ISSN: 0449-1947

Source: Le Journal de Physique Colloques, Vol.48, Iss.C6, 1987-11, pp. : C6-165-C6-170

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next