PLASMA CVD USING ORGANOMETALLIC COMPOUNDS

Publisher： Edp Sciences

E-ISSN： 0449-1947|50|C5|C5-739-C5-746

ISSN： 0449-1947

Source： Le Journal de Physique Colloques, Vol.50, Iss.C5, 1989-05, pp. : C5-739-C5-746

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Related content

Deposition of titanium nitride thin films at low temperatures by CVD using metalorganic and organometallic titanium compounds as precursors

By  

Le Journal de Physique IV, Vol. 03, Iss. C3, 1993-08 ,pp. : C3-289-C3-296

Edp Sciences

Access to resources Recommend Favorite

PLASMA ASSISTED CVD USING METALLO-ORGANIC COMPOUNDS AS PRECURSORS

By  

Le Journal de Physique IV, Vol. 02, Iss. C2, 1991-09 ,pp. : C2-397-C2-404

Edp Sciences

Access to resources Recommend Favorite

CVD Synthesis of HTSC Films Using Volatile Coordination Compounds

By  

Le Journal de Physique IV, Vol. 05, Iss. C5, 1995-06 ,pp. : C5-553-C5-556

Edp Sciences

Access to resources Recommend Favorite

DEPOSITION OF BORON NITRIDE BY PLASMA ENHANCED CVD USING BORANE AMINE

By  

Le Journal de Physique IV, Vol. 02, Iss. C2, 1991-09 ,pp. : C2-617-C2-624

Edp Sciences

Access to resources Recommend Favorite

AN EXAFS STUDY OF THE FORMATION OF SMALL METAL AGGREGATES ON MgO USING ORGANOMETALLIC COMPOUNDS AS PRECURSORS

By  

Le Journal de Physique Colloques, Vol. 47, Iss. C8, 1986-12 ,pp. : C8-261-C8-264

Edp Sciences

Access to resources Recommend Favorite