Microchannels: High‐Aspect‐Ratio Parallel‐Plate Microchannels Applicable to Kinetic Analysis of Chemical Vapor Deposition (Adv. Mater. Interfaces 16/2016)

Publisher： John Wiley & Sons Inc

E-ISSN： 2196-7350|3|16|admi.201670080-admi.201670080

ISSN： 2196-7350

Source： ADVANCED MATERIALS INTERFACES (ELECTRONIC), Vol.3, Iss.16, 2016-08, pp. : n/a-n/a

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