Publisher： John Wiley & Sons Inc
E-ISSN： 1098-2760|58|11|2629-2634
ISSN： 0895-2477
Source： MICROWAVE AND OPTICAL TECHNOLOGY LETTERS, Vol.58, Iss.11, 2016-11, pp. : 2629-2634
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Plasma diagnostics measurements on the new ECR heavy ion source of ATOMKI
By Takacs E. Vamosi J. Biri S. Veibel E. Suta T. Koncz C. Raics P. Palinkas J.
Vacuum, Vol. 50, Iss. 3, 1998-07 ,pp. :
Access to resources
Recommend
Wave Propagation in Plasma Waveguides
RADIO SCIENCE, Vol. 1, Iss. 6, 1966-06 ,pp. :
Chamber wall cleaning in a reactive ECR plasma
By Horiuchi K. Nishina A. Iizuka S. Sato N.
Thin Solid Films, Vol. 316, Iss. 1, 1998-03 ,pp. :