Precisely controlled anodic etching for processing of GaAs-based quantum nanostructures and devices

Publisher: Edp Sciences

E-ISSN: 1764-7177|132|issue|249-253

ISSN: 1155-4339

Source: Le Journal de Physique IV, Vol.132, Iss.issue, 2006-03, pp. : 249-253

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next