Publisher： Edp Sciences
E-ISSN： 2261-236x|8|issue|04011-04011
ISSN： 2261-236x
Source： MATEC Web of conference, Vol.8, Iss.issue, 2013-11, pp. : 04011-04011
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
We report measurement of the ablation depth and self-reflectivity from thin silicon films illuminated by a single tightly focused femtosecond laser pulse. We show the dependence of ablation depth on incident laser pulse fluence can be modeled with a transfer-matrix method, taking into account transient reflectivity and light propagation in a stratified medium. We find optical interference effects in laser ablation of thin films are of crucial importance. Furthermore, We present the evidence of self-scattering effects due to the buildup of a three dimensional submicron sized plasma in the focal region.
Related content
Access to resources
Recommend
Access to resources
Development of laser ablation plasma by anisotropic self-radiation
EPJ Web of Conference, Vol. 59, Iss. issue, 2013-11 ,pp. :