Electrical and Optical Properties of Fluorine Doped Tin Oxide Thin Films Prepared by Magnetron Sputtering

Author： Banyamin Ziad Y.   Kelly Peter J.   West Glen   Boardman Jeffery  

Publisher： MDPI

E-ISSN： 2079-6412|4|4|732-746

ISSN： 2079-6412

Source： Coatings, Vol.4, Iss.4, 2014-10, pp. : 732-746

Access to resources Favorite

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Properties of ITO films prepared by reactive magnetron sputtering

By Kleinhempel Ronny   Kaune Gunar   Herrmann Matthias   Kupfer Hartmut   Hoyer Walter   Richter Frank  

Microchimica Acta, Vol. 156, Iss. 1-2, 2006-11 ,pp. : 61-67

Springer Publishing Company

Access to resources Recommend Favorite

Surface Properties of Nanostructured, Porous ZnO Thin Films Prepared by Direct Current Reactive Magnetron Sputtering

By Kwoka Monika   Lyson-Sypien Barbara   Kulis Anna   Maslyk Monika   Borysiewicz Michal Adam   Kaminska Eliana   Szuber Jacek  

Materials, Vol. 11, Iss. 1, 2018-01 ,pp. : 131-131

MDPI

Access to resources Recommend Favorite

Translation Effects in Fluorine Doped Tin Oxide Thin Film Properties by Atmospheric Pressure Chemical Vapour Deposition

By Afzaal Mohammad   Yates Heather M.   Hodgkinson John L.  

Coatings, Vol. 6, Iss. 4, 2016-10 ,pp. : 43-43

MDPI

Access to resources Recommend Favorite

Electrical Characterization of Thin Cr/Indium-Tin Oxide Layer by RF Sputtering

By Akbarnejad Elaheh   Soleimani Ebrahim A.   Ghorannevis Zohreh  

Synthesis and Reactivity in Inorganic, Metal-Organic, and Nano-Metal Chemistry, Vol. 45, Iss. 11, 2015-11 ,pp. : 1728-1732

Taylor & Francis Ltd

Access to resources Recommend Favorite