Teflon/SiO2 Bilayer Passivation for Improving the Electrical Reliability of Oxide TFTs Fabricated Using a New Two-Photomask Self-Alignment Process

Author: Fan Ching-Lin   Shang Ming-Chi   Li Bo-Jyun   Lin Yu-Zuo   Wang Shea-Jue   Lee Win-Der   Hung Bohr-Ran  

Publisher: MDPI

E-ISSN: 1996-1944|8|4|1704-1713

ISSN: 1996-1944

Source: Materials, Vol.8, Iss.4, 2015-04, pp. : 1704-1713

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