Investigation of Antireflection Nb2O5 Thin Films by the Sputtering Method under Different Deposition Parameters

Author： Chen Kun-Neng   Hsu Chao-Ming   Liu Jing   Liou Yu-Chen   Yang Cheng-Fu  

Publisher： MDPI

E-ISSN： 2072-666x|7|9|151-151

ISSN： 2072-666x

Source： Micromachines, Vol.7, Iss.9, 2016-09, pp. : 151-151

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