Study on the Properties of 1319 nm Ultra-High Reflector Deposited by Electron Beam Evaporation Assisted by an Energetic RF Ion Source

Author: Deng Songwen   Li Gang   Wang Feng   Lv Qipeng   Sun Long   Jin Yuqi  

Publisher: MDPI

E-ISSN: 2079-6412|8|2|74-74

ISSN: 2079-6412

Source: Coatings, Vol.8, Iss.2, 2018-02, pp. : 74-74

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