Chemical Vapor Transport Deposition of Molybdenum Disulfide Layers Using H2O Vapor as the Transport Agent

Author: Zhao Shichao   Weng Jiaxin   Jin Shengzhong   Lv Yanfei   Ji Zhenguo  

Publisher: MDPI

E-ISSN: 2079-6412|8|2|78-78

ISSN: 2079-6412

Source: Coatings, Vol.8, Iss.2, 2018-02, pp. : 78-78

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Abstract

Molybdenum disulfide (MoS2) layers show excellent optical and electrical properties and have many potential applications. However, the growth of high-quality MoS2 layers is a major bottleneck in the development of MoS2-based devices. In this paper, we report a chemical vapor transport deposition method to investigate the growth behavior of monolayer/multi-layer MoS2 using water (H2O) as the transport agent. It was shown that the introduction of H2O vapor promoted the growth of MoS2 by increasing the nucleation density and continuous monolayer growth. Moreover, the growth mechanism is discussed.