Nanopatterning via Self-Assembly of a Lamellar-Forming Polystyrene-block-Poly(dimethylsiloxane) Diblock Copolymer on Topographical Substrates Fabricated by Nanoimprint Lithography

Author: Borah Dipu   Cummins Cian   Rasappa Sozaraj   Senthamaraikannan Ramsankar   Salaun Mathieu   Zelsmann Marc   Liontos George   Ntetsikas Konstantinos   Avgeropoulos Apostolos   Morris Michael A.  

Publisher: MDPI

E-ISSN: 2079-4991|8|1|32-32

ISSN: 2079-4991

Source: Nanomaterials, Vol.8, Iss.1, 2018-01, pp. : 32-32

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