Impact on the Gas Barrier Property of Silicon Oxide Films Prepared by Tetramethylsilane-Based PECVD Incorporating with Ammonia

Author: Liu Hua-Wen   Chen Tai-Hong   Chang Chun-Hao   Lu Shao-Kai   Lin Yi-Cyuan   Liu Day-Shan  

Publisher: MDPI

E-ISSN: 2076-3417|7|1|56-56

ISSN: 2076-3417

Source: Applied Sciences, Vol.7, Iss.1, 2017-01, pp. : 56-56

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Abstract