Investigations on the Role of N2:(N2 + CH4) Ratio on the Growth of Hydrophobic Nanostructured Hydrogenated Carbon Nitride Thin Films by Plasma Enhanced Chemical Vapor Deposition at Low Temperature

Author： Khanis Noor Hamizah   Ritikos Richard   Ahmad Kamal Shafarina Azlinda   Abdul Rahman Saadah  

Publisher： MDPI

E-ISSN： 1996-1944|10|2|102-102

ISSN： 1996-1944

Source： Materials, Vol.10, Iss.2, 2017-01, pp. : 102-102

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