Low Temperature SiGe Steam Oxide - Aqueous Hf and NH3/NF3 Remote Plasma Etching and its Implementation as Si GAA Inner Spacer

Publisher： Trans Tech Publications

E-ISSN： 1662-9779|2018|282|126-131

ISSN： 1012-0394

Source： Solid State Phenomena, Vol.2018, Iss.282, 2018-10, pp. : 126-131

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