Modelling of EUV light sources based on microwave discharge in inhomogeneous flow of nonequilibrium plasma with multiply charged tin and xenon ions

Author： Abramov I.S.  

Publisher： Edp Sciences

E-ISSN： 2100-014x|187|issue|01001-01001

ISSN： 2100-014x

Source： EPJ Web of Conference, Vol.187, Iss.issue, 2018-09, pp. : 01001-01001

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