Structural and ellipsometric study on tailored optical properties of tantalum oxynitride films deposited by reactive sputtering

Publisher： IOP Publishing

E-ISSN： 1361-6463|47|47|475201-475212

ISSN： 0022-3727

Source： Journal of Physics D: Applied Physics, Vol.47, Iss.47, 2014-11, pp. : 475201-475212

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Physical properties of zirconium oxynitride films deposited by reactive magnetron sputtering

By  

Journal of Physics: Conference Series , Vol. 100, Iss. 8, 2008-03 ,pp. : 206-209

IOP Publishing

Access to resources Recommend Favorite

Optical properties of aluminum-doped zinc oxide films deposited by direct-current pulse magnetron reactive sputtering

By Xiao-Yong Gao   Chao Chen   Sa Zhang  

Chinese Physics B, Vol. 23, Iss. 3, 2014-03 ,pp. : 30701-30705

IOP Publishing

Access to resources Recommend Favorite

Structural, optical and electrical properties of V doped ZnO thin films deposited by r.f. magnetron sputtering

By  

Journal of Physics: Conference Series , Vol. 253, Iss. 1, 2010-11 ,pp. : 243-248

IOP Publishing

Access to resources Recommend Favorite

Effects of Rapid Thermal Processing on Microstructure and Optical Properties of As-Deposited Ag2O Films by Direct-Current Reactive Magnetron Sputtering

By Xiao-Yong Gao   Hong-Liang Feng   Zeng-Yuan Zhang   Jiao-Min Ma   Jing-Xiao Lu  

Chinese Physics Letters, Vol. 27, Iss. 2, 2010-02 ,pp. : 26804-26807

IOP Publishing

Access to resources Recommend Favorite

Structures and properties of Y-ZrO2 thin films deposited by reactive r.f. sputtering

By  

Le Journal de Physique IV, Vol. 03, Iss. C3, 1993-08 ,pp. : C3-611-C3-615

Edp Sciences

Access to resources Recommend Favorite