Investigation of isochronal annealing on the optical properties of HWCVD amorphous silicon nitride deposited at low temperatures and low gas flow rates

Publisher： IOP Publishing

E-ISSN： 1742-6596|619|1|62-65

ISSN： 1742-6596

Source： Journal of Physics: Conference Series , Vol.619, Iss.1, 2015-06, pp. : 62-65

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