Fluidized‐Bed Chemical Vapor Deposition of Silicon on Very Dense Tungsten Powder

E-ISSN： 1521-4125|38|7|1254-1260

ISSN： 0930-7516

Source： CHEMICAL ENGINEERING & TECHNOLOGY (CET), Vol.38, Iss.7, 2015-07, pp. : 1254-1260

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Silicon coating on very dense tungsten particles by fluidized bed CVD for nuclear application

PHYSICA STATUS SOLIDI (A) APPLICATIONS AND MATERIALS SCIENCE, Vol. 212, Iss. 7, 2015-07 ,pp. : 1599-1606

John Wiley & Sons Inc

Access to resources Recommend Favorite

Encapsulating the electroluminescent phosphor micro-particles using a pulsed metal-organic chemical vapor deposition process in a fluidized bed

By Kim J. Han G.Y. Chung C.-H.

Thin Solid Films, Vol. 409, Iss. 1, 2002-04 ,pp. : 58-65

Elsevier

Access to resources Recommend Favorite

Preparation of Highly Flexible SiC Nanowires by Fluidized Bed Chemical Vapor Deposition

CHEMICAL VAPOR DEPOSITION (ELECTRONIC), Vol. 948-1907, Iss. 7-8-9, 2015-09 ,pp. : 196-203

John Wiley & Sons Inc

Access to resources Recommend Favorite

Uniform Deposition of Chemical Vapor Deposition Diamond Films on Slender Tungsten Wires

Materials Science Forum, Vol. 2016, Iss. 848, 2016-04 ,pp. : 618-623

Trans Tech Publications

Access to resources Recommend Favorite

Theoretical analysis and modeling of the obtaining of polycrystalline silicon in a fluidized-bed reactor

By Borodulya V. Vinogradov L. Rabinovich O. Akulich A.

Journal of Engineering Physics and Thermophysics, Vol. 78, Iss. 1, 2005-01 ,pp. : 47-53

Springer Publishing Company

Access to resources Recommend Favorite