Efficiency of silane gas generation in high-rate silicon etching by narrow-gap microwave hydrogen plasma

Author： Ohmi Hiromasa   Funaki Takeshi   Kakiuchi Hiroaki   Yasutake Kiyoshi  

Publisher： IOP Publishing

E-ISSN： 1361-6463|49|3|35202-35211

ISSN： 0022-3727

Source： Journal of Physics D: Applied Physics, Vol.49, Iss.3, 2016-01, pp. : 35202-35211

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