Erratum to: Effects of in situ annealing on the properties of Al-doped ZnO thin films deposited by RF magnetron sputtering

By Kim Deok-Kyu   Park Choon-Bae  

Journal of Materials Science: Materials in Electronics, Vol. 25, Iss. 4, 2014-04 ,pp. : 1596-1596

Springer Publishing Company

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Effects of in situ annealing on the properties of Al-doped ZnO thin films deposited by RF magnetron sputtering

By Kim Deok-Kyu   Park Choon-Bae  

Journal of Materials Science: Materials in Electronics, Vol. 25, Iss. 4, 2014-04 ,pp. : 1589-1595

Springer Publishing Company

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Influence of film thickness and annealing atmosphere on the structural, optical and luminescence properties of nanocrystalline TiO 2 thin films prepared by RF magnetron sputtering

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Journal of Materials Science: Materials in Electronics, Vol. 24, Iss. 7, 2013-07 ,pp. : 2453-2460

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Structural and electrical properties of RuO₂ thin films prepared by rf-magnetron sputtering and annealing at different temperatures

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Effect of LP-buffer on the structure of ZnO thin films prepared on glass substrate using RF magnetron sputtering

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