Effect of Oxygen Flow Rate and Post Annealing on Vanadium Oxide Thin Films Prepared by DC Pulse Magnetron Sputtering

E-ISSN： 1662-9795|2016|675|233-236

ISSN： 1013-9826

Source： Key Engineering Materials, Vol.2016, Iss.675, 2016-02, pp. : 233-236

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