Stability and formation kinetics of TiN and silicides in the Ti/Si3N4 diffusion couple

Publisher： Edp Sciences

E-ISSN： 1764-7177|03|C7|C7-1069-C7-1072

ISSN： 1155-4339

Source： Le Journal de Physique IV, Vol.03, Iss.C7, 1993-11, pp. : C7-1069-C7-1072

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