Publisher： Edp Sciences
E-ISSN： 1764-7177|09|PR8|Pr8-425-Pr8-430
ISSN： 1155-4339
Source： Le Journal de Physique IV, Vol.09, Iss.PR8, 1999-09, pp. : Pr8-425-Pr8-430
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Related content
Low pressure chemical vapor deposition of Cu
Le Journal de Physique IV, Vol. 11, Iss. PR3, 2001-08 ,pp. :
Access to resources
Recommend
By Lian-Kai Wang Ren-Jun Liu You Lü Hao-Yu Yang Guo-Xing Li Yuan-Tao Zhang Bao-Lin Zhang
Chinese Physics B, Vol. 24, Iss. 1, 2015-01 ,pp. :
Low-pressure chemical vapour deposition of mullite coatings in a cold-wall reactor
Le Journal de Physique IV, Vol. 09, Iss. PR8, 1999-09 ,pp. :
Comparative study of atomic layer deposition and low-pressure MOCVD of copper sulfide thin films
Le Journal de Physique IV, Vol. 11, Iss. PR3, 2001-08 ,pp. :