Quantitative analysis of the weak anti-localization effect in ultrathin bismuth films

Author： Sangiao S.   Marcano N.   Fan J.   Morellón L.   Ibarra M. R.   Teresa J. M. De  

Publisher： Edp Sciences

E-ISSN： 1286-4854|95|3|37002-37002

ISSN： 0295-5075

Source： EPL (EUROPHYSICS LETTERS), Vol.95, Iss.3, 2011-07, pp. : 37002-37002

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