Publisher: John Wiley & Sons Inc
E-ISSN: 1521-4125|41|3|454-460
ISSN: 0930-7516
Source: CHEMICAL ENGINEERING & TECHNOLOGY (CET), Vol.41, Iss.3, 2018-03, pp. : 454-460
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Concentration-dependent redistribution of arsenic in silicon during thermal oxidation
By Choi S.S. Park M.J. Chu W.K.
Thin Solid Films, Vol. 258, Iss. 1, 1995-03 ,pp. :