First‐Principles Computational Screening of Dopants to Improve the Deacon Process over RuO2

Publisher: John Wiley & Sons Inc

E-ISSN: 1867-3899|10|2|465-469

ISSN: 1867-3880

Source: CHEMCATCHEM (ELECTRONIC), Vol.10, Iss.2, 2018-01, pp. : 465-469

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Abstract