The impact of substrate bias on a remote plasma sputter coating process for conformal coverage of trenches and 3D structures

Publisher： IOP Publishing

E-ISSN： 1361-6463|48|33|335303-335312

ISSN： 0022-3727

Source： Journal of Physics D: Applied Physics, Vol.48, Iss.33, 2015-01, pp. : 335303-335312

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