Fabrication and Characterization of Pd/TiO 2 /Si MIS Structure with TiO 2 Film as Insulator Layer Deposited by Low Temperature Arc Vapor Deposition Process

Author: Shubham Kumar   Khan R.U.   Chakrabarti P.  

Publisher: American Scientific Publishers

ISSN: 2330-0779

Source: Advanced Science Focus, Vol.1, Iss.2, 2013-06, pp. : 156-161

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract