Mechanism and kinetics of thin zirconium and hafnium oxide film growth in an ALD reactor

Author： Deminsky M.   Knizhnik A.   Belov I.   Umanskii S.   Rykova E.   Bagatur'yants A.   Potapkin B.   Stoker M.   Korkin A.  

Publisher： Elsevier

ISSN： 0039-6028

Source： Surface Science, Vol.549, Iss.1, 2004-01, pp. : 67-86

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