Depth profiles of shallow implanted layers by soft ion sputtering and total-reflection X-ray fluorescence

Author: Krzyzanowska H.   von Bohlen A.   Klockenkamper R.  

Publisher: Elsevier

ISSN: 0584-8547

Source: Spectrochimica Acta Part B: Atomic Spectroscopy, Vol.58, Iss.12, 2003-12, pp. : 2059-2067

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