Effect of ion-bombardment on the deposition of a-CN x :H films in CH 4 /N 2 r.f. plasma

Author: Mutsukura N.   Daigo Y.  

Publisher: Elsevier

ISSN: 0925-9635

Source: Diamond and Related Materials, Vol.12, Iss.10, 2003-10, pp. : 2057-2060

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Abstract