Author: Abril I.
Publisher: Springer Publishing Company
ISSN: 1434-6060
Source: The European Physical Journal D - Atomic, Molecular and Optical Physics, Vol.54, Iss.1, 2009-07, pp. : 65-70
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Study of HfO 2 films prepared by ion-assisted deposition using a gridless end-hall ion source
Thin Solid Films, Vol. 350, Iss. 1, 1999-08 ,pp. :
HfO 2 films with high laser damage threshold
By Alvisi M. Di Giulio M. Marrone S.G. Perrone M.R. Protopapa M.L. Valentini A. Vasanelli L.
Thin Solid Films, Vol. 358, Iss. 1, 2000-01 ,pp. :
Ferroelectricity and Antiferroelectricity of Doped Thin HfO2‐Based Films
ADVANCED MATERIALS, Vol. 27, Iss. 11, 2015-03 ,pp. :