Characteristics of Ga-Al Doped ZnO Thin Films with Plasma Treatment Prepared by Using Facing Target Sputtering Method

Author: Kim Ki Hyun   Choi Hyung Wook   Kim Kyung Hwan  

Publisher: American Scientific Publishers

ISSN: 1533-4899

Source: Journal of Nanoscience and Nanotechnology, Vol.13, Iss.9, 2013-09, pp. : 6293-6295

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Abstract