A Bayesian parallel site methodology with an application to uniformity modeling in semiconductor manufacturing

ISSN： 0740-817X

Source： IIE Transactions, Vol.41, Iss.9, 2009-09, pp. : 754-763

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Multimode variation modeling and process monitoring for serial-parallel multistage manufacturing processes

By Jin Ran

IIE Transactions, Vol. 45, Iss. 6, 2013-06 ,pp. : 617-629

Taylor & Francis Ltd

Access to resources Recommend Favorite

Application-driven methodology for new additive manufacturing materials development

By Olivier Djamila Borros Salvador Reyes Guillermo

Rapid Prototyping Journal, Vol. 20, Iss. 1, 2014-01 ,pp. : 50-58

Emerald Group Publishing Ltd

Access to resources Recommend Favorite

Iteratively adaptive regularization in inverse modeling with Bayesian outlook – application on geophysical data

By Roy I. G.

Inverse Problems in Science and Engineering, Vol. 14, Iss. 3, 2006-04 ,pp. : 333-333

Taylor & Francis Ltd

Access to resources Recommend Favorite

Capability flexibility: a decision support methodology for parallel service and manufacturing systems with flexible servers

By Iravani Seyed

IIE Transactions, Vol. 43, Iss. 5, 2011-05 ,pp. : 363-382

Taylor & Francis Ltd

Access to resources Recommend Favorite

Bayesian hierarchical modeling for monitoring optical profiles in low-E glass manufacturing processes

IIE Transactions, Vol. 47, Iss. 2, 2015-02 ,pp. : 109-124

Springer Publishing Company

Access to resources Recommend Favorite