A spatial rule adaptation procedure for reliable production control in a wafer fabrication system

Author： Baek D. H.   Yoon W. C.   Park S. C.  

Publisher： Taylor & Francis Ltd

ISSN： 0020-7543

Source： International Journal of Production Research, Vol.36, Iss.6, 1998-06, pp. : 1475-1491

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Modelling, control and simulation of an IC wafer fabrication system: a generalized stochastic coloured timed Petri Net approach

By Lin M-H.   Fu L-C.  

International Journal of Production Research, Vol. 38, Iss. 14, 2000-09 ,pp. : 3305-3341

Taylor & Francis Ltd

Access to resources Recommend Favorite

Finite-capacity production planning algorithms for a semiconductor wafer fabrication facility

By Horiguchi K.   Raghavan N.   Uzsoy R.   Venkateswaran S.  

International Journal of Production Research, Vol. 39, Iss. 5, 2001-03 ,pp. : 825-842

Taylor & Francis Ltd

Access to resources Recommend Favorite

Prioritising production and engineering lots in wafer fabrication facilities: a simulation study

By Crist Kristy  

International Journal of Production Research, Vol. 49, Iss. 11, 2011-06 ,pp. : 3105-3125

Taylor & Francis Ltd

Access to resources Recommend Favorite

Selection of dispatching rules on multiple dispatching decision points in real-time scheduling of a semiconductor wafer fabrication system

By Hyeung-Sik Min   Yuehwern Yih  

International Journal of Production Research, Vol. 41, Iss. 16, 2003-11 ,pp. : 3921-3941

Taylor & Francis Ltd

Access to resources Recommend Favorite

A neural network procedure for kanban allocation in JIT production control systems

By Savsar M.   Choueiki M.H.  

International Journal of Production Research, Vol. 38, Iss. 14, 2000-09 ,pp. : 3247-3265

Taylor & Francis Ltd

Access to resources Recommend Favorite