Author： Misra A. Hoagland R.G. Kung H.
Publisher： Taylor & Francis Ltd
ISSN： 1478-6443
Source： Philosophical Magazine, Vol.84, Iss.10, 2004-04, pp. : 1021-1028
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Abstract
We report the development of thermally stable nanoscale layered structures in sputter deposited Cu/Nb multilayered films with 75 nm individual layer thickness, vacuum annealed at temperatures of 800°C or lower. The continuity of the layered structure was maintained and layer thickness unchanged in the annealed films. The nanolayers were observed to be offset by shear at the triple-point junctions that had equilibrium groove angles and were aligned in a zigzag pattern. A mechanism is proposed for the evolution of this 'anchored' structure that may be resistant to further morphological instability.
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