Preparation and Photo- and Thermal-Curing Properties of Copolymers Applied in Negative-Type Photoresists

Author： Huang H.-Y.   Chen H.  

Publisher： Taylor & Francis Ltd

ISSN： 1542-1406

Source： Molecular Crystals and Liquid Crystals, Vol.548, Iss.1, 2011-10, pp. : 3-16

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