Chemically enhanced sputtering in fluorine-containing plasmas: Application to tungsten oxyfluoride

Author： Azens A.   Stjerna B.   Granqvist C.G.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.254, Iss.1, 1995-01, pp. : 1-2

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