Patterning of an electron beam resist with a scanning tunnelling microscope operating in air

Author: Kragler K.   Gunther E.   Leuschner R.   Falk G.   Von Seggern H.   Saemann-Ischenko G.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.264, Iss.2, 1995-08, pp. : 259-263

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Abstract