Formation of titanium silicides by titanium deposition onto silicon with simultaneous self-ion bombardment

Author: Gusev I.V.   Chapljuk V.I.   Belevsky V.P.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.278, Iss.1, 1996-05, pp. : 57-60

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Abstract