Activation energy for Ni 2 Si and NiSi formation measured over a wide range of ramp rates

Author: Colgan E.G.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.279, Iss.1, 1996-06, pp. : 193-198

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract