Titanium-containing hydrofluoric acid pretreatment for aluminum chemical vapor deposition

Author： Sugai K.   Kishida S.   Shinzawa T.   Okabayashi H.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.280, Iss.1, 1996-07, pp. : 142-146

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