Effect of target temperature on the reactive d.c.-sputtering of silicon and niobium oxides

Author： Chau R.Y.   Ho W.-S.   Wolfe J.C.   Licon D.L.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.287, Iss.1, 1996-10, pp. : 57-64

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