Metal-organic chemical vapour deposition of manganese gallium alloys from the novel mixed metal single-source precursors (CO) 5 Mn-Ga(C 2 H 5 ) 2 [N(CH 3 ) 3 ], (CO) 5 Mn-Ga(C 2 H 5 ) 2 (NC 7 H 13 ) and [(CO) 5 Mn] 2 Ga[(CH 2 ) 3 NMe 2 ]

Author: Fischer R.A.   Miehr A.   Metzger T.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.289, Iss.1, 1996-11, pp. : 147-152

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