Author: Lobau J. Wolfrum K. Romphorst A. Galla K. Seeger S.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.289, Iss.1, 1996-11, pp. : 272-281
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
XPS and ellipsometric study of DLC/silicon interface
By Zajckova L. Veltruska K. Tsud N. Franta D.
Vacuum, Vol. 61, Iss. 2, 2001-05 ,pp. :
XPS and AFM study of chemical mechanical polishing of silicon nitride
By Yang G.-R. Zhao Y.-P. Hu Y.Z. Paul Chow T. Gutmann R.J.
Thin Solid Films, Vol. 333, Iss. 1, 1998-11 ,pp. :