Stress field polarity effect on defects generation in thin silicon dioxide films

Author: El-Hdiy A.   Salace G.   Jourdain M.   Meinertzhagen A.   Vuillaume D.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.296, Iss.1, 1997-03, pp. : 106-109

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Abstract