Indium tin oxide films prepared by radio frequency magnetron sputtering method at a low processing temperature

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Elsevier

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Characteristics of indium tin oxide films deposited by r.f. magnetron sputtering

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Properties of indium tin oxide films with indium tin modulation layers prepared by nano-scale controlled reactive magnetron sputtering

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Characterizations of titanium oxide films prepared by radio frequency magnetron sputtering

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Reactive thermal deposition of indium oxide and tin-doped indium oxide thin films on InP substrates

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