Preparation of Pb(Zr,Ti)O 3 thin films by RF-magnetron sputtering with single stoichiometric target: structural and electrical properties

By Thomas R.   Mochizuki S.   Mihara T.   Ishida T.  

Thin Solid Films, Vol. 413, Iss. 1, 2002-06 ,pp. : 65-75

Elsevier

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Preparation and characterization of highly oriented Pb(Zr,Ti)O 3 thin films with seeding titanium layer deposited at low temperature by facing target sputtering

By Li X.-S.   Tanaka T.   Suzuki Y.  

Vacuum, Vol. 59, Iss. 2, 2000-11 ,pp. : 800-805

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Optical properties of amorphous PbZr x Ti 1-x O 3 (x=0.52) thin films prepared by RF magnetron sputtering

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The thickness dependence of (Ba 0.5 Sr 0.5 )TiO 3 thin films deposited on indium tin oxide-coated glass substrate using r.f. magnetron sputtering

By Kim T.S.   Oh M.H.   Kim C.H.  

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Growth of PbTiO 3 thin films by r.f. sputtering on vicinal MgO(100) substrates

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