Effects of photo-excitation and organic vapor treatment on vapor sorption behavior of sputtered fluoropolymer films

By Sugimoto I.   Shimada R.  

Thin Solid Films, Vol. 338, Iss. 1, 1999-01 ,pp. : 291-299

Elsevier

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The influence of hydrogen dilution ratio on the crystallization of hydrogenated amorphous silicon films prepared by plasma-enhanced chemical vapor deposition

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Thin Solid Films, Vol. 302, Iss. 1, 1997-06 ,pp. : 17-24

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Some issues on hydrogen and hydrogenation of plasma enhanced chemical vapor deposited films in a-Si:H thin-film transistors

By Kuo Y.  

Vacuum, Vol. 59, Iss. 2, 2000-11 ,pp. : 484-491

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Effect of hydrogen dilution on the growth of nanocrystalline silicon films at high temperature by using plasma-enhanced chemical vapor deposition

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Thin Solid Films, Vol. 437, Iss. 1, 2003-08 ,pp. : 68-73

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Impedance study on electrochemical characteristics of sputtered DLC films

By Zeng A.   Liu E.   Zhang S.   Tan S.N.   Hing P.   Annergren I.F.   Gao J.  

Thin Solid Films, Vol. 426, Iss. 1, 2003-02 ,pp. : 258-264

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